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Continuous Wave Magnetrons
Toshiba
Continuous wave magnetrons are used for plasma processing in the manufacture of semiconductors and in industrial dielectric heating applications.
Features
- High efficiency and long operating life
- Low spurious and low noise
- Small magnetic field leakage
- Low anode voltages
- Compact and lightweight
- High frequency stability (especially in our coaxial magnetrons)
Lineup
| Type | Frequency (MHz) |
Output Power (kW) |
Cooling | Weight (kg) |
Dimensions L × W × H (mm) |
|---|---|---|---|---|---|
| 2M164 | 2,440 - 2,450 | 1.6 | FA | 2.5 | 145 × 132 × 170 |
| E3327 | 2,440 - 2,470 | 6.0 | WA | 2.5 | 153 × 120 × 160 |
| E3328 | 2,450 - 2,470 | 3.0 | WA | 4.3 | 145 × 135 × 170 |
| 2M68 | 2,240 - 2,460 | 5.0 | WA | 1.0 | Φ 72 × 190 |
♦Notes
- FA:Forced Air Cooling AWA:Water/Forced Air Cooling
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